Back قالب ضوئي Arabic Màscara fotogràfica Catalan Fotomaske German Máscara fotográfica Spanish ماسک تصویر Persian Masque photographique French フォトマスク Japanese Фотошаблон Kazakh 포토마스크 Korean Fotomaska Polish

Photomask

A photomask. This photomask has 20 copies, also called layers, of the same circuit pattern or design.
A schematic illustration of a photomask (top) and an IC layer printed using it (bottom)

A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon). In semiconductor manufacturing, a mask is sometimes called a reticle.[1][2]

In photolithography, several masks are used in turn, each one reproducing a layer of the completed design, and together known as a mask set. A curvilinear photomask has patterns with curves, which is a departure from conventional photomasks which only have patterns that are completely vertical or horizontal, known as manhattan geometry. These photomasks require special equipment to manufacture.[3]

  1. ^ "Reticle Manufacturing". KLA. Retrieved 2024-01-05.
  2. ^ Diaz, S.L.M.; Fowler, J.W.; Pfund, M.E.; Mackulak, G.T.; Hickie, M. (November 2005). "Evaluating the Impacts of Reticle Requirements in Semiconductor Wafer Fabrication". IEEE Transactions on Semiconductor Manufacturing. 18 (4): 622–632. doi:10.1109/TSM.2005.858502. ISSN 0894-6507. S2CID 37911295.
  3. ^ "The Quest for Curvilinear Photomasks". 15 April 2021.
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